Definition and lifecycle
Agent, goal, tools, autonomy, verify, start, stream, replay.
Getting started, reference, runbooks, the autonomy model, the CLI and the platform limits. The documentation describes the design; sections marked design preview will change before release.
Illustrative scenario: Module M2 · 300 mm · metal-1 · lot L-48213, one lot through metal-1, one approval gate
From an empty fab-edge node to a shadow-mode run.
The Waferira SDK is typed Python. Tools are declared with schemas and recipe-window limits and the policy engine enforces them at call time, not in a review meeting. This is a design preview; the API will change before release.
# Design preview. Bound the litho agent to scanner SCN-07.
from waferira import Agent, Tool, Limit, Autonomy
recipe = Tool(
name="secs.write_recipe",
tool="SCN-07",
params=["correctables.per_field", "dose"],
limits=[Limit(window="qualified", max_step="0.5%", per="lot")],
)
litho = Agent(
id="agent.litho_overlay",
goal="overlay residual < 3 nm, CD inside M1 window",
tools=[recipe, Tool("metrology.read_overlay", read_only=True)],
# bounded writes; humans still gate holds and out-of-window moves
autonomy=Autonomy.L3,
# simulate on the fab twin before every write
verify="twin",
)
run = litho.start(lot="L-48213", layer="M1")
for step in run.stream():
print(step.name, step.status, step.duration)
What each section of the reference covers.
Agent, goal, tools, autonomy, verify, start, stream, replay.
Tool and parameter naming, units, read_only, Limit(window, max_step, per, floor, ceiling).
Levels, approval routing, tool-state and qualification conditions, OCAP linkage, versioning and review.
Steps, status values (queued, running, waiting, approval, succeeded, failed, blocked), durations, outcomes.
Fields, export formats, retention, excursion and customer evidence packets.
twin.simulate, candidates, horizon, ranking objectives, as-run comparison, qualification memory.
Every Waferira run is an ordered, inspectable sequence. This is run_7b2e9c on Module M2 · 300 mm · metal-1 · lot L-48213. Scenario completes in 10 steps with one approval gate. Overlay and CD predicted inside spec, one reticle-repeater signature caught and held for review, dispatch re-optimised, lot released with full genealogy.
Fab Orchestrator · Pulled lot L-48213 from fab MES: 25 wafers, 300 mm, metal-1 layer, route, reticle, overlay and CD spec and the standing cycle-time target. Locked the target envelope for the run.
Fab Twin · Simulated 64 candidate correctable, recipe and dispatch sets on the as-run fab twin and ranked them on predicted overlay residual, CD uniformity, excursion risk and cycle time.
Litho-and-Overlay · Per-field overlay correctables and a focus-dose trim written to scanner SCN-07 over SECS/GEM after the previous lot's residual trended toward the control limit. Predicted overlay residual back inside spec.
Etch-and-Depo · Chamber B on etcher ETCH-12 showed an edge-fast uniformity drift in FDC. Pressure and RF trims written within the qualified recipe window; predicted CD uniformity recovered.
CMP-and-Implant · Downforce and platen-speed trim on CMP-03 against the virtual removal-rate estimate to hold post-CMP thickness and dishing inside the window.
Defect-and-Inspect · Inline optical, e-beam review and SEM imagery fused at the tool edge. 1,412 events classified, most dispositioned nuisance; one reticle-repeater signature on three dies flagged for review.
Metrology-and-Virtual · Virtual metrology scored every wafer at post-etch and post-CMP from tool-sensor and FDC signatures. Two wafers routed to physical metrology on predicted variance; the rest sampled at plan.
Fab Orchestrator · The reticle-repeater signature called for a reticle inspection hold and a recipe move outside the qualified window. Held for the module process engineer and approved at 03:14:27.
Yield-and-Dispatch · Dispatch re-optimised across 1,840 lots in WIP under reticle, chamber and qualification constraints. The lot routed to the qualified chamber with the shortest predicted queue; AMHS move issued to the stocker.
Quality-and-Conformance · Lot L-48213 moved on: genealogy written (recipe moves, correctables, FDC signatures, VM scores, defect map, approvals) and checked against the layer spec.
Every tool invocation, argument and result is written to an append-only, IP-isolated, human-readable log, and every reasoning step is expandable. Nothing about a run is hidden from the fab.
Plan, thought, action, observation, exactly as the orchestrator would record it.
Run lot L-48213 through metal-1 on module M2, hold overlay and CD inside the layer spec, catch any excursion before physical metrology, and dispatch on cycle-time target.
Simulate the lot on the twin first. Lead with litho so the correctables are right before etch, then trim etch and CMP against virtual metrology, keep inspection continuous, and hold anything outside the qualified window for a human.
The previous lot's overlay residual on SCN-07 trended toward the control limit. On the twin, a per-field correctable update with a small dose trim brings the predicted residual back to 2.6 nm without touching focus.
twin.simulate(candidates=64) returns set #41: per-field correctables and dose minus 0.3% on SCN-07, chamber B pressure and RF trims on ETCH-12, downforce minus 2% on CMP-03.
Set #41 predicts overlay residual 2.6 nm, CD uniformity inside window and excursion risk 0.05. Nine candidates cut cycle time further but routed the lot to an unqualified chamber and were discarded.
Execute set #41 under autonomy level L3: seven recipe writes inside the qualified window, the reticle hold and the out-of-window move routed to the module process engineer.
Reticle-repeater signature on three dies at 03:09:40 from the fused inspection stream. Virtual metrology routed two wafers to physical measurement on predicted variance.
Scenario complete. Overlay and CD predicted inside spec, the repeater held and reviewed with the OCAP linked, the lot dispatched to a qualified chamber and released with full genealogy.
What to do when.
| Situation | What happens | What you do |
|---|---|---|
| Edge node offline | Tools stay on their own controllers and qualified recipes | Check the node, restore, resume at the current autonomy level |
| Model version fails canary | Automatic fallback to the previous validated version on that module | Review the evaluation record before re-promoting |
| Approval not answered | The step waits; the run does not time out into a write | Named approver or delegate decides in the console |
| Deadlock between agents | Escalates to a human rather than resolving by timeout | Decide in the console; the decision is logged |
| Rollback condition met | The recipe returns to its previous qualified version | Review the trigger signal, the OCAP and the run record |
A fab does not go from manual APC to unattended control in one step. Waferira makes the level explicit, auditable and reversible at any time. The first release runs shadow mode, then assist mode, then graduated autonomy for low-risk APC, defect and metrology loops.
| Level | What the agent does | What the human does | Where it sits in a pilot |
|---|---|---|---|
| L1 · Advisory | Recommends recipe moves, dispositions and dispatch, with citations | Enters every change manually | Shadow mode, first on the design-partner cell |
| L2 · Supervised | Proposes a recipe write or hold; it executes on approval | Approves each move in the review console | Assist mode, where accuracy and ROI are proven |
| L3 · Bounded | Writes inside the qualified recipe window, tool-state checks and OCAP linkage | Approves holds, out-of-window moves and lot release | Graduated autonomy for low-risk APC, defect and metrology loops |
| L4 · Qualified loops | Runs a qualified loop without prompting, inside its envelope | Sets the envelope; reviews the shift record | Planned; reserved for loops the fab has qualified |
The same run engine, the same policy checks, the same IP-isolated audit trail, from the terminal, the review console or the SDK. Design preview.
$ waferira run "lot L-48213 through M1 on module M2" --autonomy L3
→ plan composed 10 steps · 1 approval gate
→ twin.simulate 64 candidates · best #41 · excursion risk 0.05
→ policy.evaluate 7 recipe writes inside window · 1 held for human
→ executing litho.correctables .. ok 1m20s
→ executing etch.uniformity .... ok 58s
→ executing cmp.removal ........ ok 46s
→ executing vm.score ........... ok 2.1s
! approval required reticle_hold · recipe move outside window
→ approved module process engineer · 03:14:27
→ scenario complete 1 hold reviewed · lot L-48213 released
$ waferira lots show L-48213 --format genealogy
Design targets. None is a measured figure.
| Item | Design target | Notes |
|---|---|---|
| Priority defect triage latency | under 200 ms | TensorRT on fab-edge GPUs |
| Inspection streams per pilot module | 10 to 50 | Metropolis, DeepStream, Holoscan |
| Virtual-metrology scoring | 1 to 5 s per lot-step | CUDA, RAPIDS, Triton; nightly retraining |
| Dispatch re-optimisation | every 1 to 5 minutes | cuOpt, RAPIDS, constrained |
| Process-control training | 500 to 2,000 GPU-hours per process family per quarter | DGX or HGX, CUDA, cuDNN |
| Twin simulations | 1,000 to 10,000 per fab per day | Omniverse, OVX access planned |
| Synthetic rare-event variants | 100k to 1M per module | Cosmos, Omniverse Replicator; validated against real distributions |
| Edge robot and AMHS perception | local, low latency | Jetson Orin; Jetson Thor planned |
Waferira writes to production tools over SECS/GEM. Every capability is scoped to a qualified recipe window, every write is policy-checked against tool state, and every action is written to an append-only, IP-isolated audit log the fab owns.
| Item | Scope | Status |
|---|---|---|
| SOC 2 Type I and fab-security review | Control plane | QUEUED Planned, first 6 months |
| SOC 2 Type II | Control plane | QUEUED Planned, 6 to 12 months |
| SSO and RBAC | Console and approvals | QUEUED Planned, 6 to 12 months |
| IP-isolation and security assurance package | Fab security and IT and OT review | QUEUED Planned, 6 to 12 months |
| SEMI-standards-cited reasoning | Recipes, integration specs, OCAPs | RUNNING In the design, every answer cites its source |
| Per-tenant IP isolation | Data, models, memory | RUNNING In the design from day one |
| On-prem and fab-edge deployment | IP-sensitive fabs | RUNNING Design option |
The questions fab directors and process engineers ask in the first meeting.
Yes, over SECS/GEM, but only inside the qualified recipe window for that tool, with per-parameter limits and tool-state checks, and only at the autonomy level your fab has set. Level 1 is advisory: Waferira recommends and an engineer enters everything. Design partners start there, in shadow mode.
The tool stays on its own controller and its last qualified recipe. Waferira is a supervisory layer on top of the APC, inspection, metrology and MES systems you already run, never a replacement for them, so an outage leaves the module running the way it runs today.
No. Inference and feature storage stay at the fab edge, recipes, device designs, defect libraries and process memory are isolated per tenant, and an on-prem control plane is available for IP-sensitive fabs. Any cross-fab learning is planned, contract-gated and privacy-preserving, and none of it moves recipes or designs.
Advisory recommendations start from the existing APC, metrology and ADC data on the wedge module. Defect classification, virtual metrology and excursion prediction improve as labelled events and lot outcomes accumulate per process family. Rare excursions are augmented synthetically only after validation against real distributions.
You are, the same as with any APC strategy, which is why every write is policy-checked, bounded to the qualified window, logged and reversible, and why holds, out-of-window moves and lot release wait for a named approver with the OCAP linked.
A paid pilot on one process module or tool fleet, scoped to one wedge workflow with a baseline agreed in writing. Shadow mode first, observing and measuring the baseline. Then assist mode, where the agent recommends and your engineer approves and accuracy and ROI are measured. Then bounded autonomy for low-risk APC, defect or metrology loops if the fab is satisfied.
Documentation beyond this page opens with the design-partner cohort.
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